OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton Inc., a leading manufacturer of light sources used in lithography, has announced that in the field of Laser-Produced Plasma (LPP) light sources for EUV ...

A long-term solution to light source problems associated with extreme UV (EUV) lithography may have been found, following the creation of the world's most energetic light beam. Researchers at Argonne ...

US startup aims to develop free-electron lasers directly emitting EUV light, in place of today’s laser-driven plasma systems. xLight, a US startup aiming to commercialize particle accelerator driven ...

Add Yahoo as a preferred source to see more of our stories on Google. A California-based laboratory is set to lay the groundwork for the next evolution of extreme ultraviolet (EUV) lithography. Led by ...

Extreme ultraviolet (EUV) lithography relies on sources emitting around 13.5 nm to pattern features at the sub-10 nm scale in semiconductor manufacturing. The prevailing approach utilises ...

Professor Tsumoru Shintake of the Okinawa Institute of Science and Technology (OIST) has proposed an extreme ultraviolet (EUV) lithography technology that he claims is superior to the method currently ...

SAN DEIGO — JMAR Technologies Inc. here demonstrated a laser-driven light generator source that promises to solve some of the major problems for next-generation lithography (NGL) systems, based on ...

(Nanowerk News) The future has a color: it is extreme ultraviolet. With the help of EUV light it is possible, for example, to produce smaller and more powerful microchips than ever before. But further ...